High frequency switching power supplies and pulse power supplies are two different types of power converters, with their main differences in output waveform, operating frequency, adjustment method, and application field.
Output waveform: The output waveform of a high-frequency switching power supply is high-frequency alternating current, usually a square wave or similar waveform, which can be obtained through transformers and rectifier filtering to obtain the required DC or AC power supply; The output waveform of a pulse power supply is a pulsed direct current, usually a single positive pulse or a double positive negative pulse waveform. The output voltage or current can be controlled by adjusting the pulse width or frequency.
Operating frequency: The operating frequency of high-frequency switching power supplies is generally in the range of 50-100kHz, which can reduce the volume and weight of transformers and filtering components, and improve conversion efficiency; The working frequency of pulse power supply is generally within the range of 1-10kHz, which can reduce the loss and interference of switching devices and improve output stability.
Adjustment method: The adjustment method of high-frequency switching power supply is generally pulse width modulation (PWM) or pulse frequency modulation (PFM), which controls the output voltage or current by changing the pulse width or frequency output by the inverter; The regulation method of pulse power supply is generally digital control, which controls the output voltage or current by controlling the opening time and proportion of positive and negative pulses.
Application areas: High frequency switching power supplies are widely used in various fields, such as electronic devices, computers, communication, medical, etc., requiring the use of different DC or AC voltages to drive various chips and components; Pulse power supply is mainly used in the field of electroplating, such as gold plating, silver plating, nickel plating, tin plating, etc., which requires the use of different positive and negative pulses to improve the performance and quality of the coating.
